机译:srTiO(sub 3)(100)上的外延pb(Zr(sub x)Ti(sub 1(minus)x))O(sub 3)/ srRuO(sub 3)(x = 0,0.35,0.65)多层薄膜通过mOCVD和RF溅射制备mgO(100)和mgO(100)
Lead Compounds ; PZT ; Ruthenium Oxides ; Strontium Oxides ; Titanates ; Chemical Vapor Deposition ; Composite Materials ; Crystal Structure ; Experimental Data ; Ferroelectric Materials ; Interfaces ; Layers ; Magnesium Oxides ; Physical Properties ; Silver ; Sputtering ; Strontium Titanates ; Meetings ; Tables(data);
机译:(100)/(001)取向外延Pb(Zr_(0.35),Ti_(0.65))O_3薄膜的电学性能比较,在(100)Si和(100)SrTiO_3衬底上生长具有相同(001)域分数的薄膜
机译:(100)_cSrRuO_3 /(100)SrTiO_3衬底上生长的具有90°畴的不同体积分数的外延Pb(Zr_(0.35)Ti_(0.65))O_3薄膜的疲劳特性
机译:高(100)取向外延Pb(Zr_(0.35),Ti_(0.65))O_3薄膜的畴结构
机译:通过MOCVD和RF溅射在SrTiO3(100)和MgO(100)上制备外延Pb(ZrxTi1-x)O3 / SrRuO3(x = 00.350.65)多层薄膜
机译:溅射沉积外延(1-x)Pb(Mg1 / 3Nb2 / 3)O3-- xPbTiO3薄膜的结构性质关系。
机译:通过脉冲激光沉积制备具有可调光学性能的超均匀Pb0.865La0.09(Zr0.65Ti0.35)O3薄膜
机译:srTiO {sub 3}(100)上的外延pb(Zr {sub x} Ti {sub 1 {minus} x})O {sub 3} / srRuO {sub 3}(x = 0,0.35,0.65)多层薄膜通过mOCVD和RF溅射制备mgO(100)和mgO(100)
机译:srTiO(sub 3)(100)上的外延pb(Zr(sub x)Ti(sub 1(minus)x))O(sub 3)/ srRuO(sub 3)(x = 0,0.35,0.65)多层薄膜通过mOCVD和RF溅射制备mgO(100)和mgO(100)