...
首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Co-doped ZnO dilute magnetic semiconductor thin films by pulsed laser deposition: Excellent transmittance, low resistivity and high mobility
【24h】

Co-doped ZnO dilute magnetic semiconductor thin films by pulsed laser deposition: Excellent transmittance, low resistivity and high mobility

机译:通过脉冲激光沉积共掺杂的ZnO稀释的磁性半导体薄膜:优异的透射率,低电阻率和高迁移率

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

The 120-nm-thick Co -doped ZnO (CZO) dilute magnetic semiconductor films were grown by pulsed laser deposition at various substrate temperatures (T-s) of 100-700 degrees C. During the film's growth, Ar or O-2 or Ar/O-2-mixed gas atmosphere was used. Hall measurements indicate the CZO films prepared in Ar atmosphere possess the lower resistivity. Then, the microstructural, optical, electrical and magnetic properties of the CZO films deposited in Ar atmosphere were investigated in detail. For the deposition in Ar atmosphere, the lowest resistivity of 4.30 x 10(-2) Omega-cm appeared in the 400 degrees C -grown CZO film since it had more oxygen vacancies with 0 charge state (Vg). As the T-s was raised to 100-300 degrees C, the CZO films had low mobilities of 5.1-10.7 cm(2)/V. This is attributed to the formation of oxygen vacancies with 2+ charge state (V-O(2+)), resulting from the appearance of lattice distortions in these films. A significant relaxation of lattice distortion occurred in the 400 degrees C -grown CZO film, causing the efficient reduction in the amount of V-O(2+). Therefore, the 400 degrees C -grown film had a relatively high mobility of 21.0 cm(2)/V. With increasing the T-s to 400-700 degrees C, the transmittances (@450 nm) of 84.1%-95.8% were obtained in the CZO films. Furthermore, the saturation magnetization values of 100, 400 and 700 degrees C -grown CZO films were 2.74 x 10(-5), 3.37 x 10(-5) and 5.33 x 10(-5) emu, respectively. These results suggest the CZO films are highly potential for spintronic and optoelectronic applications, especially for the 400 degrees C-grown film. (C) 2015 Published by Elsevier B.V.
机译:通过在100-700摄氏度的各种衬底温度(Ts)上进行脉冲激光沉积,生长120纳米厚的Co掺杂ZnO(CZO)稀磁半导体薄膜。在薄膜生长期间,Ar或O-2或Ar /使用O-2-混合气体气氛。霍尔测量表明,在Ar气氛中制备的CZO膜具有较低的电阻率。然后,详细研究了在Ar气氛中沉积的CZO膜的微观结构,光学,电学和磁性。对于在Ar气氛中的沉积,在400摄氏度生长的CZO膜中出现了4.30 x 10(-2)Ω-cm的最低电阻率,因为它具有更多的零电荷状态(Vg)的氧空位。当T-s升高到100-300摄氏度时,CZO膜的迁移率为5.1-10.7 cm(2)/ V。这归因于在这些膜中出现晶格畸变,从而形成了具有2+电荷状态(V-O(2+))的氧空位。在400摄氏度生长的CZO膜中发生了明显的晶格畸变松弛,从而有效降低了V-O(2+)的量。因此,400摄氏度生长的薄膜具有相对较高的迁移率,为21.0 cm(2)/ V。随着T-s升高至400-700摄氏度,在CZO膜中获得了84.1%-95.8%的透射率(@ 450 nm)。此外,在100、400和700摄氏度下生长的CZO膜的饱和磁化强度值分别为2.74 x 10(-5),3.37 x 10(-5)和5.33 x 10(-5)emu。这些结果表明,CZO膜在自旋电子和光电应用中具有很高的潜力,尤其是对于400摄氏度生长的膜。 (C)2015由Elsevier B.V.发布

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号