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The effect of ionization and CH_3 ligand for hydrogen storage in Co- and Ni-based organometallic compounds

机译:电离和CH_3配体对钴和镍基有机金属化合物中氢存储的影响

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Maximum capacities of the hydrogen storage in organometallic compounds consisting of Co and Ni atoms bound to C_mH_m ring (m = 4, 5; capped type) were, respectively, found as 3.48 and 3.49 wt % (Guo et al., Struct Chem, 2009, 20, 1107). Here, we extend this study to structures having a transition metal (TM) inserted in C_mH_m ring (inserted type), having TM located on either a C_4H 4+ or a C_5H 5+ molecule, and the CH_3 ligand bound to the organometallic compounds. We find that for the CoC_4H_4 and NiC_4H _4 complexes, the capped types are 1.39 eV and 1.41 eV higher in energy than the inserted types, respectively, while the ground states for CoC_5H_5 and NiC_5H_5 complexes are found to be the capped type, which are lower than the inserted types, respectively, by 1.27 eV and 1.31 eV. The maximum capacity of hydrogen storage reached 5.13 wt % for both of CoC_4H 4+(H_2)_3 complex and the inserted-type CoC_4H_4(H_2) _3 complex with a reasonable binding energy (0.3-1.0 eV per H _2). The positively charged C_4H_4 and C _5H_5 molecules do not only improve the capacity of hydrogen storage but also make all H_2 adsorbing in molecular form and keep the adsorption energy in an ideal range. After adding the CH_3 ligand to the compounds, the average adsorption energy of H_2 decreased to an ideal range 0.61-0.94 eV per H_2 and the stability of the compounds is also improved. Finally, we analyze the HOMO-LUMO gaps and display the kinetic stability when H_2 was added to organometallic compounds.
机译:发现由结合在C_mH_m环上的Co和Ni原子组成的有机金属化合物(m = 4,5;封端型)中的最大氢存储容量为3.48 wt%和3.49 wt%(Guo et al。,Struct Chem,2009) ,20,1107)。在这里,我们将这项研究扩展到具有在C_mH_m环(插入型)中插入的过渡金属(TM),TM位于C_4H 4+或C_5H 5+分子上且CH_3配体与有机金属化合物结合的结构。我们发现,对于CoC_4H_4和NiC_4H _4配合物,其封端类型的能量分别比插入类型高1.39 eV和1.41 eV,而发现CoC_5H_5和NiC_5H_5配合物的基态为封端类型,较低比插入的类型分别降低1.27 eV和1.31 eV。 CoC_4H 4+(H_2)_3配合物和插入型CoC_4H_4(H_2)_3配合物均具有合理的结合能(每H _2为0.3-1.0 eV),最大储氢量达到5.13 wt%。带正电的C_4H_4和C _5H_5分子不仅提高了储氢能力,而且使所有H_2以分子形式吸附,并将吸附能保持在理想范围内。在将CH_3配体加入到化合物中之后,H_2的平均吸附能降低到理想范围,每H_2为0.61-0.94eV,并且化合物的稳定性也得到改善。最后,我们分析了HOMO-LUMO间隙,并显示了将H_2添加到有机金属化合物中时的动力学稳定性。

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