A NEW SINGLE BATH FOR THE ELECTRODEPOSITION OF NiFe/Cu MULTILAYERS EXHIBITING GIANT MAGNETORESISTANCE BEHAVIOR

摘要

A new single bath for the electrodeposition of ultrathin NiFe/Cu multilayers was developed and magnetoresistance measurements were conducted. Complementary methods such as scanning electron microscopy (SEM), x-ray diffraction (XRD) and transmission electron microscopy (ТЕМ) were used to characterize the multilayers. Magnetoresistance measurements indicated that the multilayers grown from this new bath exhibited a giant magnetoresistance (GMR) behavior.