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ELECTRODEPOSITION OF NiFe/Cu MULTILAYERS FROM A SINGLE BATH

机译:单浴中NiFe / Cu多层膜的电沉积

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NiFe/Cu multilayers were deposited from a single bath in the potentiostatic mode using two different solutions. In solution A, the ionic concentration ratios were Fe~(2+):Ni~(2+):Cu~(2+) 9:60:10 and in solution B they were 1:103:1. To characterize the layers, scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD) and atomic force microscopy (AFM) were used. SEM results revealed the layered structure of the deposits for relatively thick bilayers. While HRTEM provided direct evidence for the composition modulation across successive layers in the NiFe/Cu nanometer-multilayered structure prepared from solution B. Therefore, the layers prepared from solution B seemed to be more appropriate for giant magnetoresistance (GMR) applications. The effect of stirring during the electrodeposition process of the multilayers was also investigated.
机译:使用两种不同的溶液以恒电位模式从单个浴中沉积NiFe / Cu多层。在溶液A中,离子浓度比为Fe〜(2 +):Ni〜(2 +):Cu〜(2+)9:60:10,在溶液B中为1:103:1。为了表征这些层,使用了扫描电子显微镜(SEM),高分辨率透射电子显微镜(HRTEM),X射线衍射(XRD)和原子力显微镜(AFM)。 SEM结果显示相对较厚的双层的沉积物的层状结构。尽管HRTEM为由溶液B制备的NiFe / Cu纳米多层结构中连续层之间的成分调制提供了直接证据。因此,由溶液B制备的层似乎更适合于巨磁阻(GMR)应用。还研究了在多层电沉积过程中搅拌的效果。

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