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首页> 外文期刊>日本セラミックス協会学術論文誌 >NH_x/OH Surface Groups in Commercial Si_3N_4 Powders Analyzed by Diffuse Reflectance Infrared Fourier Transform (DRIFT) Spectroscopy
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NH_x/OH Surface Groups in Commercial Si_3N_4 Powders Analyzed by Diffuse Reflectance Infrared Fourier Transform (DRIFT) Spectroscopy

机译:扩散反射红外傅里叶变换光谱法分析工业Si_3N_4粉末中的NH_x / OH表面基团

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摘要

NH_x/OH surface groups of four different commercial silicon nitride powders produced by two different methods: diimide precipitation and carbothermal reduction with different nitriding media were determined by diffuse reflectance infrared Fourier transform (DRIFT) spectroscopy. The results show that for both methods the nitriding media has a profound effect on the powders surface composition. In silicon nitride powders produced using NH_3 as nitriding media in both methods, surface hydrogen content in the form of NH_x/OH groups is larger than for a powder using N_2 in the carbothermal reduction process. The intensity of NH and NH_2 groups identified and quantified by DRIFT (this work) correlate with the amounts of N_2 desorbed molecules above 1300 deg C and NH_3 desorbed molecules below 1300 deg C, measured by temperature programmed desorption mass spectroscopy (TPDMS) for the same powders, respectively. It is concluded that the NH structures form part of the surface layer.
机译:通过漫反射红外傅里叶变换光谱法(DRIFT)测定了通过两种不同方法制得的四种不同市售氮化硅粉末的NH_x / OH表面基团:二酰亚胺沉淀和在不同氮化介质下的碳热还原。结果表明,对于两种方法,渗氮介质都对粉末表面成分产生深远影响。在两种方法中,使用NH_3作为氮化介质生产的氮化硅粉末中,NH_x / OH基团形式的表面氢含量都比在碳热还原过程中使用N_2的粉末的表面氢含量大。通过DRIFT鉴定和量化的NH和NH_2基团的强度(这项工作)与温度控制在1300℃以上的N_2解吸分子和1300℃以下的NH_3解吸分子的量相关(通过程序升温解吸质谱法(TPDMS)测定)粉末。结论是NH结构形成表面层的一部分。

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