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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Role of energetic plasma in pulsed laser deposition of epitaxial manganite films
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Role of energetic plasma in pulsed laser deposition of epitaxial manganite films

机译:高能等离子体在外延锰矿薄膜脉冲激光沉积中的作用

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摘要

Epitaxial La_(0.7)Sr_(0.3)MnO-3 thin films have been grown on LaAlO_3(001) substrates by pulsed laser deposition under different target-plume-substrate configurations. Outgrowths of various shape and size from some of the manganite films are observed. When the substrate is placed within the visible laser-produced energetic plasma plume, the deposited films are outgrowth-free and exhibit good crystallinity and high electrical conductivity. The formation mechanisms and control measures of the outgrowths in pulsed laser deposited manganite films are discussed.
机译:外延La_(0.7)Sr_(0.3)MnO-3薄膜已经通过在不同靶材-浮体-基板结构下的脉冲激光沉积在LaAlO_3(001)基板上生长。从某些锰矿薄膜中观察到各种形状和大小的产物。当将基板放置在可见的激光产生的高能等离子体羽流中时,沉积的薄膜不会生长,并且显示出良好的结晶度和高电导率。讨论了脉冲激光沉积锰矿薄膜中析出物的形成机理和控制措施。

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