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Suppression of ferroelectricity in ultrathin barium titanate films grown within mica-4 interlayer space

机译:在云母4层间空间内生长的超薄钛酸钡薄膜中铁电的抑制

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摘要

The critical thickness for ferroelectricity has assumed importance because of the integration of ferroelectric perovskite films into microelectronic devices. Recent calculations reported by Junquera and Ghosez (J. Junquera and Ph. Ghosez, Nature, 2003, 422, 506, ref. 11) have shown the critical thickness in the case of BaTiO3 thin films to be ca. 2.4 nm. We have grown BaTiO3 films of thickness ca. 1.2 nm within the crystal channels of sodium fluorophlogopite mica of chemical composition Na(4)Mg(6)Al(4)Si(4)O(20)F(4)center dot H2O. Dielectric permittivity measurements on the composites do not show any transition at 393 K. Several possible causes for the suppression of this dielectric anomaly have been examined e. g., reduction of BaTiO3, sodium ion introduction into BaTiO3 and generation of thermal stress on these films. All of these have been ruled out on the basis of available experimental data. We believe our results are consistent with the recently reported theoretical predictions.
机译:由于将铁电钙钛矿薄膜集成到微电子器件中,铁电的临界厚度已变得至关重要。 Junquera和Ghosez(J. Junquera和Ph.Ghosez,Nature,2003,422,506,ref.11)报道的最新计算结果表明,在BaTiO3薄膜的情况下,临界厚度大约为。 2.4纳米我们已经生长了厚度大约为10的BaTiO3膜。化学组成为Na(4)Mg(6)Al(4)Si(4)O(20)F(4)中心点H2O的氟金云母钠云母的晶体通道内1.2 nm。复合材料的介电常数测量结果表明,在393 K下没有任何跃迁。已经研究了几种抑制这种介电异常的可能原因。例如,还原BaTiO 3,将钠离子引入BaTiO 3并在这些膜上产生热应力。所有这些均已根据可用的实验数据排除。我们相信我们的结果与最近报道的理论预测是一致的。

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