首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Thickness dependence of the piezoresistive effect in p-type single crystalline 3C-SiC nanothin films
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Thickness dependence of the piezoresistive effect in p-type single crystalline 3C-SiC nanothin films

机译:p型单晶3C-SiC纳米薄膜中压阻效应的厚度依赖性

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摘要

This paper reports, for the first time, the piezoresistive effect of p-type single crystalline 3C-SiC nanothin films grown by LPCVD at low temperature. Compared to thick SiC films, the gauge factors of the 80 nm and 130 nm films decreased remarkably. This result indicates that the crystal defect at the SiC/Si interface has a significant influence on the piezoresistive effect of ultra-thin film p-type 3C-SiC.
机译:本文首次报道了通过LPCVD在低温下生长的p型单晶3C-SiC纳米薄膜的压阻效应。与厚SiC薄膜相比,80 nm和130 nm薄膜的尺寸系数显着降低。该结果表明,SiC / Si界面处的晶体缺陷对超薄膜p型3C-SiC的压阻效应具有显着影响。

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