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首页> 外文期刊>Journal of Electronic Materials >A Comparative Study of Micropipe Decoration and Counting in Conductive and Semi-Insulating Silicon Carbide Wafers
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A Comparative Study of Micropipe Decoration and Counting in Conductive and Semi-Insulating Silicon Carbide Wafers

机译:导电和半绝缘碳化硅晶片的微管装饰和计数的比较研究

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摘要

Micropipes are considered to be one of the most serious defects in silicon carbide (SiC) wafers affecting device yield.Developing a method to count and map micropipes accurately has been a challenging task.In this study,the different etching behavior of conductive and semi-insulating wafers in molten potassium oxide (KOH) is compared.Micropipes and closed-core screw dislocations exhibit different morphology after etching and can be easily distinguished with a polishing process.Based on a new sample preparation procedure and a digital imaging technique,a novel method of efficiently and reliably mapping and counting micropipes in both conductive and semi-insulating SiC wafers is developed.
机译:微管被认为是影响器件成品率的碳化硅(SiC)晶圆中最严重的缺陷之一。开发一种精确计数和绘制微管图的方法一直是一项艰巨的任务。在这项研究中,导电性和半导电性的不同蚀刻行为比较了熔化的氧化钾(KOH)中的绝缘晶片。微管和闭芯螺旋位错在蚀刻后表现出不同的形态,并且可以通过抛光工艺轻松区分。基于新的样品制备程序和数字成像技术,一种新方法开发了一种有效,可靠地绘制和计数导电和半绝缘SiC晶片中微管的方法。

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