Thick TiN films prepared by vacuum arc deposition and high energetic nitrogen ion beam dynamic mixing implantation

摘要

TiN films have many features, such as high wear resistance, high corrosion resistance and good oxidization resistance. With the technology of vacuum are deposition and high current density nitrogen ion beam dynamic mixing implantation (DMI), the TiN film with a thickness of 33 mum and adhesion 58 N is synthesized on hard alloy and highspeed steel substrates. X-ray diffraction has been used to examine the crystal structure of the films. The results showed that the main phases presented in DMI films are TiN and TiN and that the films revealed random growth. Cross-sectional scanning electron microscopy revealed the dense morphology and the thickness of the films. Micro-hardness tests showed that the average hardness of the films was about 2500 H K. Electrochemical experimental results indicated that DMI-TiN film had excellent corrosion resistance both in 3% NaCl solution and in 0.5 Mol H2SO4 solution. (C) 2003 Elsevier Science Ltd. All rights reserved. [References: 14]