METHODS OF PRODUCING THIN BORON-NITRIDE FILMS

摘要

In recent years, thin films of cubic boron nitride (c-BN) have attracted researchers' interest. The advantages of c-BN include great hardness, high thermal conductivity, and chemical inertness at high temperatures. The main factor preventing widespread use of thin c-BN films is the difficulty of depositing single-phase films with hardness and electrical properties comparable to the values for bulk material. This article considers ways of producing thin boron-nitride films by methods of plasma-chemical and physical deposition. The deposition rate, and the phase and component composition of deposited BN films are analyzed. The most efficient methods of producing films with high content of the cubic phase of BN are identified. These methods are based on the action of ion flows with a condensing phase.