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首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >Enhancement and stabilization of the photoluminescence from porous silicon prepared by Ag-assisted electrochemical etching
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Enhancement and stabilization of the photoluminescence from porous silicon prepared by Ag-assisted electrochemical etching

机译:Ag辅助电化学刻蚀制备的多孔硅的光致发光增强和稳定

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摘要

In this paper, we present the results of studies on the photoluminescence (PL) of porous silicon (PSi) samples obtained by etching with the assistance of silver metal in different ways. If the Si sample, after being coated with a layer of silver nanoparticles, is electrochemically etched, its PL intensity becomes hundreds of times stronger than the PL intensity when it is chemically etched in the similar conditions. The difference in the PL intensities is explained partly by the anodic oxidation of silicon which occurs during the electrochemical etching process. The most obvious evidence that silicon had been oxidized anodically in the electrochemical etching process is the disappearance of the PSi layer and the appearance of the silicon oxide layer with mosaic structure when the anodization current density is large enough. The anodic oxidation has the effect of PSi surface passivation. Because of that, the PL of obtained PSi becomes stronger and more stable with time.
机译:在本文中,我们介绍了通过不同的方式借助银金属蚀刻获得的多孔硅(PSi)样品的光致发光(PL)的研究结果。如果在用银纳米粒子涂层后对Si样品进行电化学蚀刻,则其PL强度将比在类似条件下进行化学蚀刻时的PL强度强数百倍。 PL强度的差异部分地由在电化学蚀刻过程中发生的硅的阳极氧化来解释。在阳极氧化电流密度足够大时,在电化学蚀刻过程中硅已被阳极氧化的最明显证据是PSi层的消失和具有镶嵌结构的氧化硅层的出现。阳极氧化具有PSi表面钝化的作用。因此,所获得的PSi的PL随着时间变得更强且更稳定。

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