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Facile measurement of polymer film thickness ranging from nanometer to micrometer scale using atomic force microscopy

机译:使用原子力显微镜轻松测量从纳米级到微米级的聚合物膜厚度

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摘要

As many properties of polymer thin films critically depend on their thickness, a convenient and cost-effective method for precise measurement of film thickness in a wide range is highly desirable. Here, we present a method which enables polymer film thickness, ranging from nanometer to micrometer scale, to be facilely determined by measuring the height of an artificially created film step on smooth substrates with atomic force microscopy (AFM). Three polymeric films (polystyrene, poly(methyl methacrylate) and poly(styrene-ethylene/butylene-styrene) films), spin-coated on either mica or quartz substrate with thickness ranging from 5.7 nm to 4.4 μm, were employed to demonstrate the procedure and feasibility of our method. The proposed method is particularly suitable for thicker polymer films, thus complementing the traditional AFM 'tip-scratch' method which is generally limited to polymer films of no more than 100 nm thickness.
机译:由于聚合物薄膜的许多性能主要取决于其厚度,因此非常需要一种方便且经济高效的方法来在宽范围内精确测量膜厚度。在这里,我们提出了一种方法,该方法能够通过使用原子力显微镜(AFM)测量在光滑基板上人工制作的薄膜台阶的高度,来轻松确定从纳米级到微米级的聚合物薄膜厚度。使用三种聚合物膜(聚苯乙烯,聚(甲基丙烯酸甲酯)和聚(苯乙烯-乙烯/丁烯-苯乙烯)膜)旋涂在云母或石英基板上,厚度范围为5.7 nm至4.4μm,以演示该过程和我们方法的可行性。所提出的方法特别适合于较厚的聚合物膜,因此补充了传统的AFM“刮刮”方法,该方法通常限于厚度不超过100 nm的聚合物膜。

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