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The Four-Quadrant Phase-Mask Coronagraph. II. Simulations

机译:四象限相罩日冕仪。二。模拟

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In the first paper in this series, we described the principle of a coronagraph utilizing a four-quadrant phase mask and the results of numerical simulations obtained in the perfect case. In this second paper, we performed additional numerical simulations to assess in more detail the performances and limitations of this coronagraph under real conditions.The effect of geometrical parameters such as shape and size of both the phase mask and the Lyot stop is studied. We also analyze the effect of low- and high-order aberrations generated, for instance, by the atmospheric turbulence. An important issue is the wavelength dependence of the phase mask. We show that the performance decreases rapidly as the spectral bandwidth is increased, and as a consequence, we discuss the manufacturing of achromatized masks using multiple thin films. An optical concept is proposed.
机译:在本系列的第一篇论文中,我们描述了使用四象限相位掩模的日冕仪的原理以及在理想情况下获得的数值模拟结果。在第二篇论文中,我们进行了额外的数值模拟,以更详细地评估此日冕仪在实际条件下的性能和局限性。研究了几何参数(例如相位掩模和Lyot挡块的形状和尺寸)的影响。我们还分析了大气湍流产生的低阶和高阶像差的影响。一个重要的问题是相位掩模的波长依赖性。我们表明,随着频谱带宽的增加,性能迅速下降,因此,我们讨论了使用多个薄膜制造消色差掩模的过程。提出了光学概念。

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