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Absorption and reflection analysis of transparent conductive Ga-doped ZnO films

机译:透明导电掺杂Ga的ZnO薄膜的吸收和反射分析

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摘要

Transparent conductive films of 2 at% Ga-doped ZnO films were prepared on C-plane sapphire substrates by e-beam evaporation in vacuum. The optical absorption, reflectance, structural and electrical properties of 2 at% Ga-doped ZnO films were investigated. The films are highly transparent (> 80 %) in visible-NIR ranges, and the optical bandgap exhibits a blue shift for the as-deposited films from 3.30 eV to 3.83 eV and for heat treatment from 3.27 eV to 3.60 eV for 2 at% Ga-doped ZnO films with respect to pure ZnO films. Through resistivity, optical constants (epsilon, sigma, -Im epsilon(-1) and omega(p)) and carrier concentration obtained from reflectivity and transmittance spectra for 2 at% Ga-doped ZnO films, we found that these films behave as n-type semiconductors exhibiting high carrier concentration N similar to 10(21) cm(-3). This also gives an opportunity to predict electrical behaviour of transparent conductive films on the basis of the analysis of absorption and reflection measurements.
机译:通过真空电子束蒸发,在C面蓝宝石衬底上制备了2个原子百分比的Ga掺杂的ZnO薄膜的透明导电薄膜。研究了2at%Ga掺杂ZnO薄膜的光吸收,反射率,结构和电学性质。薄膜在可见光-NIR范围内是高度透明的(> 80%),并且对于沉积态的薄膜,从3.30 eV到3.83 eV以及从3.27 eV到3.60 eV的热处理(2 at%),光学带隙都显示出蓝移相对于纯ZnO薄膜,Ga掺杂的ZnO薄膜。通过电阻率,光学常数(ε,σ,-Im epsilon(-1)和omega(p))以及从反射率和透射率光谱获得的载流子浓度,该反射率和透射率光谱是针对2个原子百分比掺杂Ga的ZnO薄膜而得出的,高载流子浓度N的10型半导体,类似于10(21)cm(-3)。这也为基于吸收和反射测量的分析预测透明导电膜的电性能提供了机会。

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