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The structural and optical properties of Cu2O films electrodeposited on different substrates

机译:电沉积在不同基板上的Cu2O薄膜的结构和光学性质

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Cuprous oxide films were successfully electrodeposited onto three different substrates through the reduction of copper lactate in alkaline solution at pH = 10. The substrates include indium tin oxide film coated glass, n-Si wafer with (001) orientation and Au film evaporated onto Si substrate. The substrate effects on the structural and optical properties of the electrodeposited films are investigated by in situ voltammetry, current versus time transient measurement, ex situ x-ray diffraction, scanning electron microscopy, UV-vis transmittance and reflectance and photoluminescence techniques. The results indicate that the choice of substrate can strongly affect the film morphology, structure and optical properties.
机译:通过在pH = 10的碱性溶液中还原乳酸铜,将氧化亚铜膜成功地电沉积到三个不同的基底上。基底包括氧化铟锡薄膜涂覆的玻璃,具有(001)取向的n-Si晶片和蒸镀到Si基底上的Au膜。通过原位伏安法,电流对时间瞬态测量,异位X射线衍射,扫描电子显微镜,紫外可见透射率和反射率以及光致发光技术研究了基材对电沉积膜结构和光学性能的影响。结果表明,基材的选择会强烈影响薄膜的形态,结构和光学性能。

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