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Optical and electronic properties of ZnO:P~+-Si heterostructures fabricated by metalorganic chemical vapour deposition

机译:金属有机化学气相沉积法制备ZnO:P / n〜+ -Si异质结构的光学和电子性质

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摘要

ZnO:P~+-Si heterostructures were fabricated on n~+-Si substrates by metalorganic chemical vapour deposition. The substrates were heavily doped with phosphorus. The crystallinity and optical properties of ZnO films were characterized by photoluminescence spectra and x-ray diffraction, respectively. X-ray photoelectron spectroscopy (XPS) showed that phosphorus atoms existed in ZnO films. The current-voltage (Ⅰ-Ⅴ) curve showed current rectification characteristic behaviour.
机译:通过金属有机化学气相沉积法在n〜+ -Si衬底上制备了ZnO:P / n〜+ -Si异质结构。衬底被重掺杂了磷。 ZnO薄膜的结晶度和光学性质分别通过光致发光光谱和X射线衍射表征。 X射线光电子能谱(XPS)表明,ZnO薄膜中存在磷原子。电流-电压(Ⅰ-Ⅴ)曲线表现出电流整流特性。

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