METALORGANIC CHEMICAL VAPOR DEPOSITION METHOD, METALORGANIC VAPOR DEPOSITION DEVICE, PROGRAM, RECORDING MEDIUM, SEMICONDUCTOR LASER PRODUCTION METHOD, SURFACE EMITTING LASER, OPTICAL SCANNER, IMAGE FORMING APPARATUS, OPTICAL TRANSMISSION MODULE, AND OPTICAL TRANSMISSION SYSTEM

摘要

PROBLEM TO BE SOLVED: To stack a non-uniform layer whose composition is gradually changed in the thickness direction thereof on a uniform layer whose composition is uniform.;SOLUTION: The compositional profile of a composition-graded layer in a reflecting mirror is assumed on the basis of film deposition conditions (S407), and stacking time for each layer and the change in intensity of reflected light upon film deposition are calculated. Then, the reflecting mirror is preliminarily film-deposited while measuring the intensity of the reflective light, and the compositional profile is corrected in such a manner that the difference between the measured result and the calculated result of the change in the intensity of the reflective light is made small (S425), and the stacking time of each layer and the change in the intensity of the reflective light upon film deposition are recalculated (S427). In an actual stacking process, during the stacking of a uniform layer, finishing timing is controlled on the basis of the measured result and the recalculated result of the change in the intensity of the reflective light, and, upon the stacking of a composition-graded layer, the stacking is finished at timing in which the passing time from the start of the stacking is made coincident with the recalculated stacking time.;COPYRIGHT: (C)2009,JPO&INPIT