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Bismuth quantum dots and strong infrared photoluminescence in migration-enhanced epitaxy grown GaAsBi-based structures

机译:迁移增强外延生长的GaAsBi基结构中的铋量子点和强红外光致发光

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摘要

The strong photoluminescence (PL) signal at wavelengths ranging from 1,300 to 1,500 nm was observed in GaAsBi epitaxial layers grown by migration-enhanced epitaxy and annealed at 600 ℃ and higher temperatures. PL measurements at liquid helium temperatures showed two peaks at ~0.9 and ~1eV. It was found that intensity of the higher energy peak decreases with temperature leaving only the lower energy peak at room temperature. Structural investigations demonstrated that annealing reduces Bi content in GaAsBi lattice by precipitating bismuth in nanometer-scale clusters. It is suggested that PL can be caused by the semimetal-semiconductor transition quantum confinement due to the quantum confinement effect in Bi clusters.
机译:在通过迁移增强的外延生长并在600℃和更高温度下退火的GaAsBi外延层中观察到了1,300至1,500 nm波长的强光致发光(PL)信号。液氦温度下的PL测量显示在〜0.9和〜1eV处有两个峰。发现较高的能量峰的强度随温度降低而降低,仅在室温下留下较低的能量峰。结构研究表明,退火会通过沉淀纳米级簇中的铋来降低GaAsBi晶格中的Bi含量。提示由于Bi团簇中的量子约束效应,PL可能是由半金属-半导体跃迁量子约束引起的。

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