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首页> 外文期刊>Microelectromechanical Systems, Journal of >Split-Frame Gimbaled Two-Dimensional MEMS Scanner for Miniature Dual-Axis Confocal Microendoscopes Fabricated by Front-Side Processing
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Split-Frame Gimbaled Two-Dimensional MEMS Scanner for Miniature Dual-Axis Confocal Microendoscopes Fabricated by Front-Side Processing

机译:适用于通过前端处理制造的微型双轴共聚焦微内窥镜的裂框万向平衡二维MEMS扫描仪

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摘要

In this paper, we introduce a 2-D microelectromechanical systems scanner for 3.2-mm-diameter dual-axis confocal microendoscopes, fabricated exclusively by front-side processing. Compared to conventional bulk micromachining that incorporates back-side etching, the front-side process is simple and thus enables high device yield. By eliminating the back-side etch window, the process yields compact and robust structures that facilitate handling and packaging. An important component of our front- side fabrication is a low-power deep reactive ion etching (DRIE) process that avoids the heating problems associated with standard DRIE. Reducing the RF etch coil power from 2400 to 1500 W leads to elimination of the spring disconnection problem caused by heat-induced aggressive local etching. In our scanner, the outer frame of the gimbal is split and noncontinuous to allow the scanner to be diced along the very edge of the scanning mirror in order to minimize the chip size (1.8 mm × 1.8 mm). The maximum optical deflection angles in static mode are ±5.5° and ±3.8° for the outer and inner axes, respectively. In dynamic operation, the optical deflection angles are ±11.8° at 1.18 kHz for the outer axis and ±8.8° at 2.76 kHz for the inner axis.
机译:在本文中,我们介绍了一种用于3.2毫米直径双轴共焦微型内窥镜的二维微机电系统扫描仪,该扫描仪是通过正面处理专门制造的。与结合了背面蚀刻的常规整体微机械加工相比,正面工艺简单,因此可以提高器件良率。通过消除背面蚀刻窗口,该工艺产生了紧凑而坚固的结构,有助于处理和封装。我们正面制造的重要组成部分是低功率深反应离子蚀刻(DRIE)工艺,它避免了与标准DRIE相关的加热问题。将RF蚀刻线圈的功率从2400降低到1500 W,可以消除由热引起的侵蚀性局部蚀刻引起的弹簧断开问题。在我们的扫描仪中,万向架的外框是分开的并且是不连续的,以使扫描仪可以沿着扫描镜的边缘切成小块,以最大程度地减小芯片尺寸(1.8 mm×1.8 mm)。在静态模式下,外轴和内轴的最大光学偏转角分别为±5.5°和±3.8°。在动态操作中,外轴在1.18 kHz时的光学偏转角为±11.8°,内轴在2.76 kHz时的光学偏转角为±8.8°。

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