Chemical vapour deposition of crystalline thin films of tantalum phosphide

C.S. Blackman; C.J. Carmalt; I.P. Parkin; S.A. ONeill; K.C. Molloy; L. Apostolico

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Chemical vapour deposition of crystalline thin films of tantalum phosphide

机译：化学气相沉积磷化钽晶体薄膜

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摘要

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl_5 and PH_2Cy at 350―500℃. The films are hard, stable to corrosive environments and show reflection properties in the infrared.

机译：通过TaCl_5和PH_2Cy在350〜500℃的化学气相沉积反应制备磷化钽涂层。该膜坚硬，对腐蚀性环境稳定，并在红外线中显示反射特性。

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来源
《Materials Letters》 |2003年第18期|p.2634-2636|共3页
作者
C.S. Blackman; C.J. Carmalt; I.P. Parkin; S.A. ONeill; K.C. Molloy; L. Apostolico;
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作者单位

Department of Chemistry, University College London, 20 Gordon Street, London WC1H OAJ, UK;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类工程材料学;
关键词
chemical vapour deposition; thin film; tantalum phosphide; barrier layer; hard; chemical resistance;

机译：化学气相沉积薄膜磷化钽阻挡层硬质耐化学性;

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机译：化学气相沉积磷化钽晶体薄膜

Chemical vapour deposition of crystalline thin films of tantalum phosphide

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