...
机译:使用极端紫外光刻技术对基于聚碳酸酯的量身定制的非化学放大型抗蚀剂进行图案化
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
Intel Corporation, RA3-252, 2501 N.W. 229th Avenue, Hillsboro, Oregon 97124, USA;
Intel Corporation, RA3-252, 2501 N.W. 229th Avenue, Hillsboro, Oregon 97124, USA;
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia;
functional materials; lithography; mechanical properties; polycarbonates; synthesis;
机译:使用极端紫外光刻技术对定制的基于聚碳酸酯的非化学放大型抗蚀剂进行构图
机译:从用于极端紫外光刻的化学放大抗蚀剂的线和空间图案中提取抗蚀剂参数
机译:新型非化学放大的分子抗蚀剂设计,具有用于多光刻应用和纳米透明仪的可切换敏感性
机译:基于聚碳酸酯的非化学扩增的光致抗蚀剂,用于极端紫外线 - (PPT)
机译:探索基于溶出抑制剂的非化学放大抗蚀剂,用于193 nm光刻。
机译:海藻糖糖醇抗性可通过电子束光刻直接写入蛋白质图案
机译:用于极端紫外光刻的聚碳酸酯基非化学放大光刻胶
机译:更新sEmaTECH 0.5 Na极紫外光刻(EUVL)微场曝光工具(mET)。会议:spIE - 极紫外(EUV)光刻V,加利福尼亚州圣何塞,2014年2月23日;相关信息:Journal.publication日期:90481m。