POSITIVE TYPE ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND A RESIST FILM AND A PATTERN FORMING METHOD USING THE COMPOSITION CAPABLE OF SIMULTANEOUSLY SATISFYING HIGH SENSITIVITY AND SUPERIOR PATTERN SHAPES UNDER EXTREME ULTRAVIOLET RAY-BASED EXPOSURE

摘要

PURPOSE: A positive type active ray-sensitive or radiation-sensitive resin composition and a resist film and a pattern forming method using the composition are provided to obtain superior resolution and light edge roughness.;CONSTITUTION: A positive type active ray-sensitive or radiation-sensitive resin composition includes a resin. The resin includes a repeating unit. The repeating unit generates acid by being decomposed based on the irradiation of active ray or radiation. The repeating unit includes a cation structure containing monocyclic or polycyclic nitrogen-containing heterocycle. The cation structure is represented by general formula AZ. A method for forming patterns includes the following: A film is formed based on the composition. The film is exposed, and the exposed film is developed.;COPYRIGHT KIPO 2012