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机译:用于极端紫外线的衰减相移掩模:它们可以减轻三维掩模的影响吗?
Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen, Germany,Friedrich Alexander University Erlangen Nuernberg, Erlangen Graduate School in Advanced Optical Technologies, Erlangen, Germany;
Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen, Germany;
Fraunhofer Institute for Integrated Systems and Device Technology, Erlangen, Germany,Friedrich Alexander University Erlangen Nuernberg, Erlangen Graduate School in Advanced Optical Technologies, Erlangen, Germany;
IMEC, Leuven, Belgium;
IMEC, Leuven, Belgium;
Carl Zeiss SMS GmbH, Betriebsstaette Rossdorf, Rossdorf, Germany;
extreme ultraviolet lithography; computational lithography; extreme ultraviolet masks; phase shift masks; telecentricity error; three-dimensional mask effects; multiobjective optimization;
机译:衰减相移掩模,用于缓解极端紫外光刻中接触孔图案中的光子散粒噪声效应
机译:通过ArF_i中的吸收体优化和极紫外光刻技术减轻掩模的三维诱导相效应
机译:用于极紫外光刻的反射型衰减相移掩模的高反射率,在深紫外条件下具有较高的检查对比度
机译:极端紫外线光刻中新型减振相移掩模结构的建议 - (PPT)
机译:辐射引起的碳污染对极紫外掩模的印刷性能的影响。
机译:更正:面罩预处理与Idazolam预处理联合使用对儿童小儿吸入诱导和术后面罩恐惧期间的焦虑和面罩接受的影响
机译:极端紫外线的减毒相移掩模:它们是否可以减轻三维掩模效果?