Strain-compensation measurement and simulation of InGaAs/GaAsP multiple quantum wells by metal organic vapor phase epitaxy using wafer-curvature

摘要

Precise strain compensation for lattice-mismatched quantum wells is crucial for obtaining high performance devices such as quantum well solar cells. High-accuracy in situ curvature monitoring is a more efficient tool to adjust growth conditions for perfect strain balancing, and we have achieved curvature measurement during growth of InGaAs/GaAsP multiple quantum wells by metal organic vapor phase epitaxy. We have also developed the curvature calculation model taking into account of thermal expansion and lattice relaxation effects based on Stoney's equation. The measured periodical curvature behavior corresponds to the growth of compressive InGaAs well layers and tensile GaAsP barrier layers and fits perfectly with a theoretical curve assuming the structural parameters (thicknesses and atomic contents) obtained by x-ray diffraction analysis, confirming correctness of the developed calculation method. Considering the proper thermal expansion coefficients for InGaAs and GaAsP, we have obtained much accurate fitting results for measured curvature.