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机译:使用闪光灯退火在碳化硅中形成硅纳米晶体
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, 01314 Dresden, Germany;
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, 01314 Dresden, Germany;
Fraunhofer Institute for Solar Energy Systems, Heidenhofstrasse 2, 79110 Freiburg, Germany;
机译:使用闪光灯退火在晶体硅中形成浅硼发射体:过量硅间隙物的作用
机译:用于硅薄膜形成的硅纳米粒子分散体的超声喷涂和闪光灯退火
机译:通过玻璃基板上非晶硅的闪光灯退火形成高度均匀的微米级厚的多晶硅膜
机译:闪光灯退火通过液相爆炸结晶形成微米级长晶粒的多晶硅膜
机译:闪光灯退火多晶硅的PMOS TFT工程源/通道/漏极区
机译:碳化硅基体中硅纳米晶的快速热退火和结晶机理研究
机译:通过快速热退火和闪光灯退火使硅和绝缘子上的硅中的硼活化和扩散