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机译:B_4C / CeO_2多层膜在6.x nm极紫外波长下的沉积和表征
Department of Information Engineering, University of Padova, via Gradenigo 6B, 35131 Padova, Italy,CNR-IFN UOS Padova, Via Trasea 7, 35131 Padova, Italy,Experimental Physics of EUV, JARA-FIT, RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany;
CNR- Istituto Officina Materiali, I-34149 Trieste, Italy;
The Technology of Optical Systems (TOS), JARA-FIT, RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany;
Central Facility for Electron Microscopy (GFE), JARA-FIT, RWTH Aachen University, Ahornstr. 55, D-52074 Aachen, Germany;
Institute of Precision Optics Engineering, Tongji University, Shanghai 200092, China;
Central Facility for Electron Microscopy (GFE), JARA-FIT, RWTH Aachen University, Ahornstr. 55, D-52074 Aachen, Germany;
Experimental Physics of EUV, JARA-FIT, RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany,Peter Gruenberg Institut (PGI-9), JARA-FIT, Forschungszentrum Juelich GmbH, 52425 Juelich, Germany;
Department of Information Engineering, University of Padova, via Gradenigo 6B, 35131 Padova, Italy,CNR-IFN UOS Padova, Via Trasea 7, 35131 Padova, Italy;
机译:Pd / B4C / Y多层涂层,用于10 nm波长附近的极端紫外线应用
机译:铱/硅多层膜,用于20-35 nm波长范围内的极端紫外线应用
机译:Mo / B_(4)C / Si多层涂层光电二极管,在13.5 nm的极紫外波长下具有偏振敏感性
机译:6.x nm波长在6.x nm波长下极端紫外光刻的抗蚀剂敏感性预测 - (ppt)
机译:钼/硅多层膜的皮秒超声表征,用于极端紫外光刻。
机译:使用长波电场对极端紫外线脉冲进行亚秒条纹测量
机译:B4C / CeO2多层膜在6.x nm极紫外波长下的沉积和表征