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Design of a CNTFET-Based SRAM Cell by Dual-Chirality Selection

机译:基于双性选择的基于CNTFET的SRAM单元设计

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This paper proposes a new design of a highly stable and low-power static RAM (SRAM) cell using carbon nanotube FETs (CNTFETs) that utilizes different threshold voltages for best performance. In a CNT, the threshold voltage can be adjusted by controlling the chirality vector (i.e., the diameter). In the proposed six-transistor SRAM cell design, while all CNTFETs of the same type have the same chirality, n-type and p-type transistors have different chiralities, i.e., a dual-diameter design of SRAM cell. As figures of merit, stability, power dissipation, and write time are considered when selecting the chirality for the best overall performance. A new metric, denoted as “SPR,” is proposed to capture these figures of merit. This metric shows that a CNTFET-based SRAM cell provides an “SPR” that is four times higher than for its CMOS counterpart that has the same configuration, thus attaining superior performance. Finally, the sensitivity of the CNTFET SRAM design to process variations is assessed and compared with its CMOS design counterpart. Extensive simulations have been performed to investigate the distribution of the power and delay of the CNTFET-based SRAM cell due to variations in the diameter, supply voltage, and temperature of the CNTFETs. The CNTFET-based SRAM cell demonstrates that it tolerates the process, power supply voltage, and temperature variations significantly better than its CMOS counterpart.
机译:本文提出了一种采用碳纳米管FET(CNTFET)的高稳定性和低功耗静态RAM(SRAM)单元的新设计,该碳纳米管FET利用不同的阈值电压来实现最佳性能。在CNT中,可以通过控制手性矢量(即直径)来调节阈值电压。在提出的六晶体管SRAM单元设计中,虽然所有相同类型的所有CNTFET具有相同的手征性,但是n型和p型晶体管具有不同的手征性,即,SRAM单元的双直径设计。作为性能指标,在选择手性以获得最佳整体性能时要考虑稳定性,功耗和写入时间。提出了一种新的指标,称为“ SPR”,以捕获这些品质因数。该度量标准表明,基于CNTFET的SRAM单元提供的“ SPR”比具有相同配置的CMOS同类产品高四倍,从而获得了卓越的性能。最后,评估了CNTFET SRAM设计对工艺变化的敏感性,并将其与CMOS设计对应物进行了比较。已经进行了广泛的仿真以研究由于CNTFET的直径,电源电压和温度的变化而导致的基于CNTFET的SRAM单元的功率分布和延迟。基于CNTFET的SRAM单元证明,其工艺,电源电压和温度变化的耐受性明显优于CMOS。

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