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Improved Performance of GaN-Based Blue LEDs With the InGaN Insertion Layer Between the MQW Active Layer and the n-GaN Cladding Layer

机译:在MQW有源层和n-GaN覆盖层之间具有InGaN插入层的,基于GaN的蓝色LED的改进性能

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摘要

In this study, we demonstrate the effect of GaN-based blue light-emitting diodes (LEDs), using an InGaN layer inserted between the n-type GaN cladding layer and the active layer (InGaN/GaN multiple quantum well), on improving device performances. With a 20-mA current injection, the results indicate that the typical output power (or forward voltage) of light-emitting diodes grown with, and without, the InGaN insertion layer are approximately 18.1 (3.1) and 15.3(3.5) mW (V), respectively. This corresponds to an enhancement in output power (wall-plug efficiency) of around 18% (33%), with the use of the InGaN insertion layer. In addition, the electrostatic discharge (ESD) endurance voltages increased from 1000 V to 6000 V when the InGaN insertion layer was applied to the GaN/sapphire-based LEDs. The improvement of output power and ESD endurance voltage could be mainly due to the fact that the Si-doped InGaN insertion layer played the role of a current-spreading layer, which led to a lower possibility of junctions suffering a large current density in specific local sites.
机译:在这项研究中,我们通过在n型GaN包层和有源层之间插入InGaN层(InGaN / GaN多量子阱),演示了基于GaN的蓝色发光二极管(LED)的效果。表演。在注入20mA电流的情况下,结果表明在有和没有InGaN插入层的情况下生长的发光二极管的典型输出功率(或正向电压)约为18.1(3.1)和15.3(3.5)mW(V ), 分别。通过使用InGaN插入层,这相当于将输出功率(壁塞效率)提高了约18%(33%)。另外,当将InGaN插入层应用于GaN /基于蓝宝石的LED时,静电放电(ESD)耐压从1000 V增加到6000V。输出功率和ESD耐压的提高主要归因于Si掺杂的InGaN插入层起着电流扩散层的作用,这导致结在特定局部受到较大电流密度影响的可能性降低网站。

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