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Dynamic Response of a-InGaZnO and Amorphous Silicon Thin-Film Transistors for Ultra-High Definition Active-Matrix Liquid Crystal Displays

机译:用于超高清有源矩阵液晶显示器的a-InGaZnO和非晶硅薄膜晶体管的动态响应

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摘要

The dynamic response of hydrogenated amorphous silicon (a-Si:H) thin-film transistor (TFT) and amorphous In-Ga-Zn-O (a-IGZO) TFT are compared. We study the storage capacitor charging characteristics by applying gate and data voltage waveforms corresponding to ultra-high definition (UHD) active-matrix liquid crystal displays (AM-LCDs). We show that the charging behavior of the a-Si:H TFT is insufficient for UHD AM-LCDs and that the a-IGZO TFT is capable of supporting at least 8 K4 K display resolution at 480 Hz. The impact of and gate voltage falling edge on feedthrough voltage is investigated. Because of higher mobility of the a-IGZO TFT, it is possible to reduce by mitigating channel charge redistribution with non-abrupt . The a-IGZO TFT shows no drawbacks in terms of when compared to the a-Si:H TFT. In addition, a larger can be used in combination with the a-IGZO TFT to reduce with minimal impact on its charging behavior. Gate overdrive operation is also evaluated for the a-IGZO TFT, which may improve charging characteristics with no adverse effects on . Our results show that t- e a-IGZO TFT is a suitable technology for UHD high-frame rate AM-LCDs.
机译:比较了氢化非晶硅(a-Si:H)薄膜晶体管(TFT)和非晶In-Ga-Zn-O(a-IGZO)TFT的动态响应。我们通过应用与超高清(UHD)有源矩阵液晶显示器(AM-LCD)相对应的栅极和数据电压波形来研究存储电容器的充电特性。我们表明,a-Si:H TFT的充电行为不足以用于UHD AM-LCD,并且a-IGZO TFT能够在480 Hz下支持至少8 K4 K的显示分辨率。研究了栅极电压下降沿和栅极电压下降沿对馈通电压的影响。由于a-IGZO TFT的迁移率更高,因此可以通过缓解沟道电荷的重新分布而降低传输速率,而不会产生突变。与a-Si:H TFT相比,a-IGZO TFT没有任何缺点。此外,可以将更大的像素与a-IGZO TFT结合使用,以减小对其充电行为的影响。还评估了a-IGZO TFT的栅极过驱动操作,这可以改善充电特性,而不会对产生不利影响。我们的结果表明,a-IGZO TFT是适用于UHD高帧率AM-LCD的合适技术。

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