Fabrication of La_0.85Na_0.15Mn_1-xNi_xO₃ (0≤x≤0.2) Thin Films on LaAlO₃ Substrates via Chemical Solution Deposition

摘要

Epitaxial La_0.85Na_0.15Mn_1-xNi_xO₃ (0≤x≤0.2) thin films are fabricated successfully on LaAlO₃ (LAO) (100) substrates using chemical solution deposition method. The results reveal that with the increase of the Ni-doping content, the x-ray diffraction intensity ratio of I₍₁₁₁₎/I₍₂₀₀₎ increases, whereas both the grain size and the roughness decrease. The magnetic and transport measurements show that it is effective to tune the MR effects via Ni doping at Mn-sites.