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Strontium titanium oxide and barium(1-x) strontium(x) titanium oxide epitaxial thin films grown by plasma-enhanced metalorganic chemical vapor deposition.

机译:通过等离子体增强的金属有机化学气相沉积法制得的锶钛氧化物和钡(1-x)锶钛氧化物外延薄膜。

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摘要

Recently, Strontium titanate (STO) and barium strontium titanate (BST) thin films have attracted increased scientific and technological interest due to their potential applications in multi-layer high temperature superconducting (HTSC) devices, uncooled IR sensing and imaging devices, dynamic random access memories and monolithic microwave integrated circuits. The goal of this dissertation work is to investigate heteroepitaxial growth of STO and BST thin films by using plasma-enhanced metalorganic chemical vapor deposition (PE-MOCVD) and to study microstructural and electrical properties of the films for applications in yttrium barium copper oxide (YBCO) based multi-layer HTSC devices and monolithic uncooled IR array sensors.; MOCVD/PE-MOCVD systems were designed and installed to meet the growth requirements for the BST films, CeO{dollar}sb2{dollar} buffer layer and multi-layer structures. The deposition conditions were optimized for uniform and high quality epitaxial growth on a large scale wafer (up to 5") based on gas flow pattern simulation. A surface smoothing process for YBCO films was developed, which improved the quality of subsequently grown BST films without deteriorating the superconducting properties of the YBCO films. For the first time, high quality STO/YBCO and BST/YBCO structures were epitaxially grown on LaAlO{dollar}sb3{dollar} substrates by PE-MOCVD. Neither impurity phases nor misorientation was found in the heterostructures. Atomically abrupt interfaces were observed and characterized by high resolution transmission electron microscopy.; Two predominant transport mechanisms, ohmic and bulk-limited Poole-Frenkel emissions, were identified in the Pt/STO/YBCO structure. The leakage current density across the SrTiO{dollar}sb3{dollar} films was {dollar}sim1times10sp{lcub}-6{rcub}{dollar} A/cm{dollar}sp2{dollar} at 2V operation. At a signal frequency of 100 KHz, a dielectric constant as high as 315 was achieved for the STO film. The electric property and dielectric behavior of the BST films were studied using I-V and C-V characterization at different temperatures and frequencies. The leakage current density across the BST films was {dollar}sim1times10sp{lcub}-7{rcub}{dollar} A/cm{dollar}sp2{dollar} at 2V operation. In particular, Ba{dollar}sb{lcub}1-rm x{rcub}{dollar}Sr{dollar}sb{lcub}rm x{rcub}{dollar}TiO{dollar}sb3{dollar} films with x = 0.25 exhibited sharp Curie transitions at temperatures around 37{dollar}spcirc{dollar}C, indicating the potential applicability for the fabrication of monolithic uncooled IR focal plane arrays. An epitaxial CeO{dollar}sb2{dollar} thin film was grown on yttria-stabilized zirconia (YSZ) substrate as a buffer layer for YBCO growth. Finally, a multi-layer structure of YBCO/STO/YBCO/CeO/YSZ was demonstrated by MOCVD/PE-MOCVD for potential multi-layer HTSC device applications.
机译:近年来,钛酸锶(STO)和钛酸锶钡(BST)薄膜由于其在多层高温超导(HTSC)器件,非制冷红外传感和成像器件,动态随机存取中的潜在应用而吸引了越来越多的科学技术兴趣。存储器和单片微波集成电路。这项工作的目的是通过使用等离子体增强金属有机化学气相沉积(PE-MOCVD)研究STO和BST薄膜的异质外延生长,并研究该薄膜在钇钡氧化铜(YBCO)中的微观结构和电学性能。 )基于多层HTSC器件和单片未冷却的IR阵列传感器。 MOCVD / PE-MOCVD系统的设计和安装可满足BST薄膜,CeO {sb2 {dollar}缓冲层和多层结构的生长要求。根据气流模式模拟,优化了沉积条件,以在大规模晶圆(最大5“)上均匀且高质量地外延生长。开发了YBCO膜的表面平滑工艺,从而提高了随后生长的BST膜的质量,而无需首次通过PE-MOCVD法在LaAlO {sb3 {dollar}衬底上外延生长了高质量的STO / YBCO和BST / YBCO结构,未发现杂质相和取向错误。观察到原子突变的界面并通过高分辨率透射电子显微镜对其进行了表征;在Pt / STO / YBCO结构中发现了两种主要的传输机制,欧姆和体积受限的Poole-Frenkel发射。 SrTiO {dollar} sb3 {dollar}薄膜在2V工作电压下为{dollar} sim1times10sp {lcub} -6 {rcub} {dollar} A / cm {dollar} sp2 {dollar},信号频率为10 0 KHz时,STO薄膜的介电常数高达315。使用I-V和C-V表征在不同温度和频率下研究了BST薄膜的电性能和介电性能。在2V工作时,整个BST膜的漏电流密度为{dol} sim1×10sp {lcub} -7 {rcub} {dollar} A / cm {dollar} sp2 {dollar}。特别是x = 0.25的Ba {dollar} sb {lcub} 1-rm x {rcub} {dollar} Sr {dollar} sb {lcub} rm x {rcub} {dollar} TiO {dollar} sb3 {dollar}薄膜在37℃左右的温度下显示出陡峭的居里跃迁,表明潜在地适用于制造单片未冷却的IR焦平面阵列。在氧化钇稳定的氧化锆(YSZ)衬底上生长外延CeO {dollar} sb2 {dollar}薄膜,作为YBCO生长的缓冲层。最后,通过MOCVD / PE-MOCVD证明了YBCO / STO / YBCO / CeO / YSZ的多层结构可用于潜在的多层HTSC器件。

著录项

  • 作者

    Liang, Shaohua.;

  • 作者单位

    Rutgers The State University of New Jersey - New Brunswick.;

  • 授予单位 Rutgers The State University of New Jersey - New Brunswick.;
  • 学科 Engineering Electronics and Electrical.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1995
  • 页码 165 p.
  • 总页数 165
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;工程材料学;
  • 关键词

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