...
首页> 外文期刊>International Journal of VLSI Design & Communication Systems >An Analytical Model for Fringing Capacitance in Double gate Hetero Tunnel FET and Analysis of effect of Traps and Oxide charges on Fringing Capacitance
【24h】

An Analytical Model for Fringing Capacitance in Double gate Hetero Tunnel FET and Analysis of effect of Traps and Oxide charges on Fringing Capacitance

机译:双栅极异质隧道FET的边缘电容分析模型以及陷阱和氧化物电荷对边缘电容的影响分析

获取原文
           

摘要

In this paper fringe capacitance of double hetero gate Tunnel FET has been studied. The physical model for fringe capacitance is derived considering source gate overlap and gate drain non overlap. Inerface trap charge and oxide charges are also introduc
机译:本文研究了双异质栅极隧道FET的边缘电容。考虑到源极栅极重叠和栅极漏极不重叠,得出了边缘电容的物理模型。还引入了界面陷阱电荷和氧化物电荷

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号