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Influence Of Assisted Ion Energy On Surface Roughness And Mechanical Properties Of Boron Carbon Nitride Films Synthesized By Dibsd

机译:辅助离子能量对Dibsd合成硼碳氮化物膜表面粗糙度和力学性能的影响

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The BCN thin films were produced by dual ion beam sputtering deposition (DIBSD). The influence of assisted ion energy on surface roughness and mechanical properties of BCN films were investigated. The surface roughness was determined by atomic force microscopy (AFM) and the mechanical properties of BCN firms were evaluated by nano-indentation in N_2 gas. The composition, structure and chemical bonding of the BCN thin films were analyzed by using energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM), laser Raman spectroscopy and Fourier transform infrared spectroscopy (FTIR). These films appeared as amorphous structure. As a result, the BCN films with the smoothest surface (R_a = 0.35nm and R_(p-v) = 4.4nm) and the highest nano-hardness of 30.1 GPa and elastic modulus of 232.6 GPa were obtained at 200 eV and 12 mA with N_2:Ar =1:1, and the chemical composition of this BCN film was 81 at.% B, 14 at.% C and 5 at.% N. Moreover, several bonding states such as B-N, B-C and C-N were observed in BCN thin films.
机译:通过双离子束溅射沉积(DIBSD)生产BCN薄膜。研究了辅助离子能量对BCN膜表面粗糙度和力学性能的影响。通过原子力显微镜(AFM)确定表面粗糙度,并通过N_2气体中的纳米压痕评估BCN公司的机械性能。通过使用能量色散光谱(EDS),透射电子显微镜(TEM),激光拉曼光谱和傅里叶变换红外光谱(FTIR)分析了BCN薄膜的组成,结构和化学键合。这些膜表现为无定形结构。结果,在200 eV和12 mA的N_2下,获得了具有最光滑表面(R_a = 0.35nm和R_(pv)= 4.4nm)和最高纳米硬度30.1 GPa和弹性模量232.6 GPa的BCN膜。 :Ar = 1:1,并且该BCN膜的化学成分为81 at。%B,14 at。%C和5 at。%N。此外,在BCN中观察到几种键合状态,例如BN,BC和CN薄膜。

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