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Influence of deposition parameters on surface roughness and mechanical properties of boron carbon nitride coatings synthesized by ion beam assisted deposition

机译:沉积参数对离子束辅助沉积合成碳氮化硼涂层表面粗糙度和力学性能的影响

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Boron carbon nitride (BCN) coatings were deposited on Si(100) wafers and Si_3N_4 disks by using ion beam assisted deposition from a boron carbide target. The BCN coatings were synthesized by the reaction between boron and carbon vapor as well as nitrogen ion simultaneously. The influence of deposition parameters such as ion acceleration voltage, ion acceleration current density and deposition ratio on the surface roughness and mechanical properties of the BCN coatings was investigated. The surface roughness was determined by using atomic force microscopy and the mechanical properties of the BCN coatings were evaluated by nano-indentation tests and friction tests in N_2 gas. The composition and chemical bonding of the BCN coatings were analyzed by using X-ray photoelectron spectroscopy. The results showed that the lower deposition rate, the smaller surface roughness and higher nano-hardness the BCN coatings were. The BCN coating with the smoothest surface (R_a= 0.25 nm and R_(P-V)=2.8 nm) and the highest nanohardness of 33 GPa as well as excellent friction property were obtained at 0.5 nm/s and the nitrogen ions were generated at 2.0 kV and 60 μA/cm~2 , and the chemical composition of this BCN coating was 49 at.% B, 42 at.% C and 9 at.% N. Moreover, there were several bonding states such as B-N, B-C and C-N with B-C-N hybridization in this BCN coating.
机译:氮化硼碳(BCN)涂层通过使用离子束辅助从碳化硼靶材沉积而沉积在Si(100)晶片和Si_3N_4磁盘上。 BCN涂层是通过硼与碳蒸气以及氮离子的同时反应合成的。研究了离子加速电压,离子加速电流密度和沉积比等沉积参数对BCN涂层表面粗糙度和力学性能的影响。通过使用原子力显微镜确定表面粗糙度,并通过纳米压痕试验和在N_2气体中的摩擦试验评估BCN涂层的机械性能。通过使用X射线光电子能谱分析了BCN涂层的组成和化学键合。结果表明,BCN涂层的沉积速率越低,表面粗糙度越小,纳米硬度越高。 BCN涂层具有最光滑的表面(R_a = 0.25 nm和R_(PV)= 2.8 nm)和最高33 GPa的纳米硬度,并且在0.5 nm / s时具有出色的摩擦性能,并且在2.0 kV时产生了氮离子BCN涂层的化学组成为60 atA / cm〜2和60μA/ cm〜2,并且BCN涂层的化学成分为49 at。%B,42 at。%C和9 at。%N。此外,存在几种键合状态,例如BN,BC和CN BCN涂层中的BCN杂交。

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