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Electrical and optical properties of Ga doped zinc oxide thin films deposited at room temperature by continuous composition spread

机译:通过连续成分扩散在室温下沉积的Ga掺杂的氧化锌薄膜的电学和光学性质

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摘要

Ga doped ZnO (GZO) thin films were deposited on glass substrates at room temperature by continuous composition spread (CCS) method. CCS is thin films growth method of various Ga_xZn_(1-x)O(GZO) thin film compositions on a substrate, and evaluating critical properties as a function position, which is directly related to material composition. Various compositions of Ga doped ZnO deposited at room temperature were explored to find excellent electrical and optical properties. Optimized GZO thin films with a low resistivity of 1.46×10~(-3) Ω cm and an average transmittance above 90% in the 550 nm wavelength region were able to be formed at an Ar pressure of 2.66 Pa and a room temperature. Also, optimized composition of the GZO thin film which had the lowest resistivity and high transmittance was found at 0.8 wt.% Ga_2O_3 doped in ZnO.
机译:Ga掺杂的ZnO(GZO)薄膜在室温下通过连续成分扩展(CCS)方法沉积在玻璃基板上。 CCS是在衬底上对各种Ga_xZn_(1-x)O(GZO)薄膜组合物进行薄膜生长的方法,并根据功能位置评估关键特性,这与材料组成直接相关。探索了在室温下沉积的各种掺杂Ga的ZnO,以发现优异的电学和光学性能。在2.66 Pa的Ar压力和室温下,可以形成具有1.46×10〜(-3)Ωcm的低电阻率和90%以上的平均透射率的优化GZO薄膜。同样,发现在掺杂有ZnO的0.8wt。%的Ga_2O_3中,具有最低电阻率和高透射率的GZO薄膜的优化组成。

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  • 来源
    《Applied Surface Science》 |2010年第21期|P.6219-6223|共5页
  • 作者单位

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1, Hawolgok-dong, Sungbuk-gu, Seoul 136-791, Republic of Korea School of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Republic of Korea;

    rnOpto-electronic Materials Center, Korea Institute of Science and Technology, 39-1, Hawolgok-dong, Sungbuk-gu, Seoul 136-791, Republic of Korea;

    rnElectronic Materials Center, Korea Institute of Science and Technology, 39-1, Hawolgok-dong, Sungbuk-gu, Seoul 136-791, Republic of Korea;

    rnSchool of Electrical and Electronic Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Republic of Korea;

    rnElectronic Materials Center, Korea Institute of Science and Technology, 39-1, Hawolgok-dong, Sungbuk-gu, Seoul 136-791, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    continuous composition spread; transparent conducting oxides; ga doped ZnO; thin film;

    机译:连续成分传播;透明导电氧化物;ga掺杂的ZnO;薄膜;

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