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Raman study of electric-field-induced first-order metal-insulator transition in VO_2-based devices

机译:VO_2基器件中电场诱导的一阶金属-绝缘体跃迁的拉曼研究

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摘要

An abrupt first-order metal-insulator transition (MIT) as a current jump has been observed by applying a dc electric field to Mott insulator VO_2-based two-terminal devices. The size of the jumps was measured to be asymmetrical depending on the direction of the applied voltage due to heating effects. The structure of VO_2 is investigated by micro-Raman scattering experiments. An analysis of the Raman-active A_g modes at 195 and 222 cm~(-1), explained by pairing and tilting of V cations, and 622 cm~(-1), shows that the modes below a low compliance (restricted) current do not change when the MIT occurs, whereas a structural phase transition above the low compliance current is found to occur secondarily, due to heating effects in the device induced by the MIT. The MIT has applications in the development of high-speed and high-gain switching devices.
机译:通过将直流电场施加到基于Mott绝缘体VO_2的两个端子设备上,已观察到突然的一阶金属-绝缘体跃迁(MIT)作为电流跃变。跳跃的大小被测量为不对称,这取决于由于加热效应所施加的电压的方向。通过显微拉曼散射实验研究了VO_2的结构。通过对V阳离子的配对和倾斜以及622 cm〜(-1)对195和222 cm〜(-1)处的拉曼活性A_g模式的分析表明,低于低顺应性(受限)电流的模式当MIT发生时,它不会改变,而由于MIT引起的器件中的热效应,第二个是在低顺应性电流之上的结构相变第二次发生。 MIT在高速和高增益开关设备的开发中具有应用。

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