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Modeling the water related trap state created in pentacene transistors

机译:对并五苯晶体管中与水有关的陷阱状态建模

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The authors report on the modeling of the water related trap state in pentacene single crystal field-effect transistors that is created by a prolonged application of a gate voltage [C. Goldmann et al., Appl. Phys. Lett. 88, 063501 (2006)]. The authors find a trap state narrow in energy to be appropriate to explain the steplike feature measured in the subthreshold region of the transfer characteristic. The trap state forms in an interface layer next to the gate insulator and is centered at 430±50 meV above the valence band edge. The density increases from (2 to 10.5) X 10~(18)/cm~3 during gate bias stress. The knowledge of the details of this defect state can help to identify the physical and chemical origin of the created trap state.
机译:作者报告了并五苯单晶场效应晶体管中与水有关的陷阱态的建模,这是通过长时间施加栅极电压[C.戈德曼(Goldmann)等人,应用。物理来吧88,063501(2006)]。作者发现能量较窄的陷阱态适合于解释在传递特性的亚阈值区域中测得的阶梯状特征。陷阱态形成在靠近栅极绝缘体的界面层中,并在价带边缘上方430±50 meV处居中。在栅极偏置应力下,密度从(2增至10.5)X 10〜(18)/ cm〜3。了解此缺陷状态的详细信息可以帮助识别所创建陷阱状态的物理和化学起源。

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