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Influence of vicinal sapphire substrate on the properties of N-polar GaN films grown by metal-organic chemical vapor deposition

机译:相邻的蓝宝石衬底对通过金属有机化学气相沉积法生长的N极GaN薄膜性能的影响

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摘要

The influence of vicinal sapphire substrates on the growth of N-polar GaN films by metal-organic chemical vapor deposition is investigated. Smooth GaN films without hexagonal surface feature are obtained on vicinal substrate. Transmission electron microscope results reveal that basal-plane stacking faults are formed in GaN on vicinal substrate, leading to a reduction in threading dislocation density. Furthermore, it has been found that there is a weaker yellow luminescence in GaN on vicinal substrate than that on (0001) substrate, which might be explained by the different trends of the carbon impurity incorporation.
机译:研究了相邻的蓝宝石衬底对金属有机化学气相沉积法生长N极性GaN膜的影响。在邻近的衬底上获得了没有六角形表面特征的光滑GaN膜。透射电子显微镜结果表明,在邻近衬底上的GaN中形成了基面堆叠缺陷,从而导致了线错位密度的降低。此外,已经发现,邻近衬底上的GaN中的黄色发光比(0001)衬底上的GaN中的发光更弱,这可以用碳杂质掺入的不同趋势来解释。

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  • 来源
    《Applied Physics Letters》 |2014年第8期|082114.1-082114.5|共5页
  • 作者单位

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

    Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China;

    School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, Shaanxi 710071, China;

    Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an, Shaanxi 710071, China;

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