金属有机化学气相沉积法生长条件对AlN薄膜面内晶粒尺寸的影响

摘要

In this paper, we investigate the effect of growth conditions on the quality of AlN film grown by metal-organic chemical vapor deposition. We test and analyze the influence of different growth conditions, such as nitridation time, growth time of AlN buffer layer and the flow rate of carrier gas, on the lateral grain size of AlN film. It is found that the redution of nitridation time, the increase of growth time of AlN buffer layer, and the reduction of the flow rate of carrier gas can enhance the lateral growth of AlN film and coalescence of islands and increase the lateral grain size of AlN film. So the quality of AlN film is improved.%　　研究了金属有机化学气相沉积设备生长条件对AlN薄膜质量的影响。应用Williamson-Hall方法测试并分析了不同氮化时间、AlN缓冲层生长时间、载气流量生长参数对AlN薄膜的面内晶粒尺寸的影响。实验结果表明，随着氮化时间减小，缓冲层生长时间增加，载气流量减少， AlN薄膜的侧向生长和岛的合并能力增强，面内晶粒尺寸增大，从而晶体质量也变好。