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StimulatedEmission Depletion Lithography with Mercapto-FunctionalPolymers

机译:受刺激具有巯基功能的排放耗尽光刻聚合物

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摘要

Surface reactive nanostructures were fabricated using stimulated emission depletion (STED) lithography. The functionalization of the nanostructures was realized by copolymerization of a bifunctional metal oxo cluster in the presence of a triacrylate monomer. Ligands of the cluster surface cross-link to the monomer during the lithographic process, whereas unreacted mercapto functionalized ligands are transferred to the polymer and remain reactive after polymer formation of the surface of the nanostructure. The depletion efficiency in dependence of the cluster loading was investigated and full depletion of the STED effect was observed with a cluster loading exceeding 4 wt %. A feature size by λ/11 was achieved by using a donut-shaped depletion beam. The reactivity of the mercapto groups on the surface of the nanostructure was tested by incubation with mercapto-reactive fluorophores.
机译:使用激发发射耗尽(STED)光刻技术来制造表面反应性纳米结构。纳米结构的官能化是通过在三丙烯酸酯单体的存在下双官能金属氧簇的共聚实现的。簇表面的配体在光刻过程中交联到单体,而未反应的巯基官能化的配体则转移到聚合物上,并在聚合物形成纳米结构表面后保持反应性。研究了取决于团簇负载的耗尽效率,并且当团簇负载超过4wt%时,观察到STED效应的完全耗尽。通过使用甜甜圈形的耗尽光束,可以将特征尺寸提高λ/ 11。通过与巯基反应性荧光团孵育来测试纳米结构表面上的巯基的反应性。

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