直流/射频耦合反应磁控溅射法类金刚石薄膜的制备与分析∗

摘要

采用直流/射频耦合反应磁控溅射法在Si(111)衬底上使用高纯石墨靶材制备出了类金刚石(DLC)薄膜.分别采用表面轮廓仪、激光拉曼光谱、傅里叶变换红外光谱、X射线光电子能谱、扫描电镜、白光干涉仪、纳米压痕对薄膜的性能进行了表征和分析.研究了沉积过程中不同工作气压(0．35~1．25 Pa)对薄膜沉积速率、结构、表面形貌及力学性能的影响.研究表明，随着工作气压的升高，薄膜的沉积速率逐渐减小，薄膜中 sp3含量先升高后降低；薄膜表面粗糙度随工作气压的升高呈现出先降低后升高的趋势，且在工作气压为1．0 Pa时达到最小值6．68 nm；随着工作气压的升高，薄膜的显微硬度与体弹性模量先升高后降低，且在工作气压为1．0 Pa时分别达到最大值11．6和120．7 GPa.%Diamond like carbon films were deposited on Si (111)substrates by coupling DC and RF reactive mag-netron sputtering from pure carbon target.The films were characterized and analyzed by stylus profilometer, Raman spectra,Fourier transform infrared spectrometer,XPS,SEM,white light interferometer and nanoin-dentation techniques.The effects of working pressure on the deposition rate,structure,morphology and hard-ness properties were investigated.The working pressure was varied between 0.35 and 1.25 Pa.It was found that as the working pressure increased,the deposition rate decreased gradually and the sp3 content in the films first increased then decreased;the surface roughness presented a trend that first decreased then increased and gained the minimum surface roughness which is 6.68nm at the working pressure of 1.0 Pa.With the pressure increas-ing,both hardness and modules of films first increased then decreased,and reached the maximum value of 1 1 .6 and 120.7 GPa respectively at the work pressure of 1.0 Pa.