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Fabrication and characterization of nanomaterials grown by electron beam induced deposition process.

机译:电子束诱导沉积工艺生长的纳米材料的制备与表征。

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摘要

Platinum- and tungsten-containing materials were grown on bulk substrates from a variety of precursors including (CH3)3CH3C5H4Pt, W(CO)6, WF6, and Pt(PF3)4 in either a high vacuum dual beam focused ion beam/scanning electron microscope (FIB/SEM) or an environmental scanning electron microscope (ESEM). The effects of deposition conditions on the growth kinetics, microstructure and composition of the grown materials, structural and chemical homogeneity of impurities inside the deposits as well as the resistivity were investigated.;First, Pt-containing deposits were grown in high vacuum SEM using (CH 3)3CH3C5H4Pt. The deposits consisted of platinum nanocrystals embedded in an amorphous matrix and intermixed with the amorphous oxide on a Si substrate. The extent of intermixing scaled with the electron beam fluence delivered to the material during EBID, and during post-growth electron beam irradiation in high vacuum (in the absence of the precursor). Second, ESEM was used to perform deposition using WF6. The deposits consisted of WO3 nanocrystals embedded in an amorphous matrix. Oxide formation was attributed to residual oxidizers present in the ESEM chamber during EBID. Under conditions of fixed low electron flux, the WO3 grain size and the degree of deposit crystallinity increased with time. These changes correlated with the degree of electron energy deposition into the material during growth. Third, W-containing nanowires were grown using W(CO)6 in high vacuum SEM. With increasing electron beam energy, the resistivity increased from 2.0x107 muO cm to 1.2x109 muO cm, while the carbon sp 2/sp3 bond ratio decreased from 1 to 0.6. The increase in resistivity was attributed to the decreasing fraction of graphitic (sp 2) bonded carbon inside the deposits. Finally, Pt-containing nanowires were grown from (CH3)3CH3C5H 4Pt in high vacuum SEM and Pt(PF3)4 in ESEM. The resistivity (∼ 104 muO cm) from nanowire grown from Pt(PF3)4 was about four orders of magnitude smaller than that (∼ 108 muO cm) from those grown from (CH 3)3CH3C5H4Pt. Cross-sectional TEM analysis revealed that the nanowires formed by decomposition of Pt(PF 3)4 have a higher degree of crystallinity and a larger size grain size and higher grain packing density compared to those by (CH 3)3CH3C5H4Pt.
机译:含铂和钨的材料在高真空双束聚焦离子束/扫描电子中由多种前体(包括(CH3)3CH3C5H4Pt,W(CO)6,WF6和Pt(PF3)4)在块状基板上生长显微镜(FIB / SEM)或环境扫描电子显微镜(ESEM)。研究了沉积条件对生长动力学,生长材料的微观结构和组成,沉积物内部杂质的结构和化学均匀性以及电阻率的影响;首先,在高真空SEM中使用( CH 3)3CH3C5H4Pt。沉积物由嵌入纳米晶中并与非晶质氧化物混合在硅衬底上的铂纳米晶体组成。混合程度与在EBID期间以及在高真空下(不存在前体的情况下)生长后电子束辐照期间传递给材料的电子束通量成比例。其次,使用ESEM使用WF6进行沉积。沉积物由嵌入无定形基质中的WO3纳米晶体组成。氧化物的形成归因于EBID期间ESEM室中存在的残留氧化剂。在固定的低电子通量的条件下,WO3晶粒度和沉积结晶度随时间增加。这些变化与生长期间电子能量沉积到材料中的程度有关。第三,使用W(CO)6在高真空SEM中生长含W的纳米线。随着电子束能量的增加,电阻率从2.0x107μOcm增大到1.2x109μOcm,而碳sp 2 / sp3键合比从1减小到0.6。电阻率的提高归因于沉积物中石墨(sp 2)键合碳的比例降低。最后,在高真空SEM中从(CH3)3CH3C5H 4Pt和ESEM中的Pt(PF3)4生长出含Pt纳米线。从Pt(PF3)4生长的纳米线的电阻率(〜104μOcm)比从(CH 3)3CH3C5H4Pt生长的纳米线的电阻率(〜108μOcm)小大约四个数量级。横截面TEM分析显示,与(CH 3)3CH3C5H4Pt相比,通过分解Pt(PF 3)4形成的纳米线具有更高的结晶度,更大的晶粒尺寸和更高的晶粒堆积密度。

著录项

  • 作者

    Li, Juntao.;

  • 作者单位

    State University of New York at Albany.;

  • 授予单位 State University of New York at Albany.;
  • 学科 Nanoscience.;Engineering Materials Science.;Nanotechnology.
  • 学位 Ph.D.
  • 年度 2010
  • 页码 258 p.
  • 总页数 258
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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