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Control of dopant-induced quantum dots by channel geometry

机译:通过沟道几何控制掺杂剂诱导的量子点

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As device dimensions are continuously scaled down, the discreteness of dopant distribution has a significant effect on conventional device operation and controllability. However, a new device concept emerged: a single dopant transistor. Recent reports have demonstrated the characteristics of single-electron transport through a single or a few isolated dopant(s) in an FET channel. It is, however, difficult to control the number and position of single dopants in nanoscale. Here, we show that the structure of dopant-induced quantum dot array can be controlled in FETs containing a large number of dopants by the channel geometry.
机译:随着器件尺寸连续缩小,掺杂剂分布的离散性对传统装置的操作和可控性具有显着影响。但是,出现了一个新的设备概念:单掺杂剂晶体管。最近的报告已经证明了通过FET通道中的单个或几个隔离的掺杂剂通过单电子传输的特性。然而,难以控制纳米级单掺杂剂的数量和位置。这里,我们表明,掺杂剂诱导的量子点阵列的结构可以控制在沟道几何形状中包含大量掺杂剂的FET中。

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