Ni nano-films processed by ammonia

摘要

The effects of ammonia processing on the nanostructures of nickel catalyst films were researched. The nickel films were prepared by metal vapor vacuum arc (MEWA) plasma deposition system on SiO_2/Si or Si substrate. It was found that the nanostructures of nickel particles were depended on the factors such as the processing time of ammonia, film thickness and the processing temperature. The appropriate processing time of ammonia and the processing temperature are the key factors to obtain high dense, small and uniform Ni nano-particles. SiO_2 layer has the effects of preventing the chemical combination between nickel and silicon during the processing period. The influence of ammonia on Ni nano-films was simply discussed.