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The Study of TiCN Coating Based on Vacuum arc ion Plating and its Performance

机译:基于真空电弧离子电镀的TICN涂层及其性能研究

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This article provides an overview of the basic properties of the TiCN hard film, preparation methods, influencing factors, and application development trend. Magnetron sputter ion plating, radiofrequency sputtering method and multi-arc ion plating three coating preparation techniques are introduced. In this paper, with the coating by multi-arc ion plating method as the study object, an overview of the impact of C and N flow to its structure, as well as temperature, coating thickness, the pulse bias, the arc current to its performance is provided. Compared to other hard coatings, the improvement in its performance is showed and the future direction of technology development of TiCN is briefly discussed.
机译:本文概述了TICN硬膜,制备方法,影响因素和应用发展趋势的基本属性。介绍了磁控溅射离子电镀,射频溅射法和多电弧离子电镀三种涂料制备技术。本文用多电弧离子镀法作为研究对象的涂层,概述了C和N流向其结构的影响,以及温度,涂层厚度,脉冲偏置,电弧电流提供性能。与其他硬涂层相比,展示了其性能的改善,并简要讨论了TICN的未来技术发展方向。

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