CHEMICAL VAPOR REDUCTIVE DEPOSITION METHOD FOR METALLIC NANOPARTICLES SUPPORTED ONTO TITANIUM DIOXIDE THIN FILM

摘要

In this study, a new nanoparticle preparation method, CVRD (Chemical Vapor Reductive Deposition), was proposed. This method allows an easy formation of metallic nanoparticles on the surface of substrate material via absorption of metal precursor on the surface, reduction, heterogeneous nucleation and particle growth. Because of successful loading of Ni nanoparticles with the size of 20 nm and well dispersion, the photocatalytic hydrogen evolution activity of TiO2 thin film could be prompted four times as much as Ni-free film, and showed the constant activity. We can conclude that CVRD method is a quite prospective technique for preparation of metallic nanoparticle on a support material surface.