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Effects of Annealing Temperature of TiO_2 Thin Film Deposited by Spray Pyrolysis Deposition Method for Dye-Sensitized Solar Cell (DSSC) Application

机译:喷雾热解沉积法对染料敏化太阳能电池(DSSC)应用的沉积TiO_2薄膜退火温度的影响

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Titanium dioxide (TiO_2) thin films have been fabricated and deposited on FTO glass substrates by spray pyrolysis deposition (SPD) method. The TiO_2 thin films were annealed at four different temperatures for an hour. The temperature was set at 100°C, 300°C, 400°C and 500°C. Surface morphology and electrical properties of TiO_2 thin films were investigated using FESEM and 2 point-probe I-V measurement, respectively. The FESEM result shows that the grain size of the TiO_2 increases when annealed temperature increases. For XRD test shows that the crystallinity improved with the increasing of annealing temperature. When the annealing temperature increases, the electrical properties of TiO_2 also change. The result shows that the optimum temperature for annealing of TiO_2 thin film was 400°C.
机译:通过喷雾热解沉积(SPD)法制造并沉积二氧化钛(TiO_2)薄膜并沉积在FTO玻璃基板上。 TiO_2薄膜在四个不同的温度下退火1小时。温度设定在100℃,300℃,400℃和500℃。使用FESEM和2点探针I-V测量研究了TiO_2薄膜的表面形态和电性能。 FeSEM结果表明,当退火温度增加时,TiO_2的晶粒尺寸增加。对于XRD测试表明,结晶度随着退火温度的增加而改善。当退火温度升高时,TiO_2的电气性能也会发生变化。结果表明,TiO_2薄膜退火的最佳温度为400℃。

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