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Photoluminescence and electroluminescence properties of GaN-based LED chips with defective regions at low excitation levels

机译:具有低激发水平缺陷区域的GaN基LED芯片的光致发光和电致发光特性

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Defective regions of LED epi-wafers and chip-wafers could be observed by a photoluminescence (PL) imaging method. As the defective regions contain high density nonradiative recombination centers, the LED chips with defective regions showed different optical properties from those of LEDs with no defective regions found by PL imaging. At low optical excitation power levels, the PL properties were influenced by nonradiative recombination dominantly. Similar phenomena were observed from electroluminescence (EL) properties at low electrical excitation levels. Research results on the similarity and difference between PL and EL properties of LED chips are presented.
机译:可以通过光致发光(PL)成像方法来观察LED外延晶片和芯片晶片的缺陷区域。由于缺陷区域包含高密度的非辐射复合中心,因此具有缺陷区域的LED芯片与通过PL成像发现无缺陷区域的LED的光学特性不同。在低光激发功率水平下,PL特性主要受非辐射复合的影响。在低电激发水平下,从电致发光(EL)特性观察到了类似的现象。提出了关于LED芯片的PL和EL特性之间的异同的研究结果。

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